IBM announced that the high-k/metal gate semiconductor process technology will be available to IBM alliance members in second half of 2009, the new technology uses 32nm process and was demonstrated using a working SOI. The new technology reduces the operational voltages and a 45% reduction in total power consumption was observed. The technology will be implemented in future multi-core processors showed 30% speed gain compared to present processing technology. IBM’s new technology will not be available until the 32nm process node. The first products based on the technology will not be available until 2010. IBM’s Partners in the project include AMD, Chartered, Freescale, Infineon and Samsung. AMD definitely needs all the help IBM’s new technology can give them as Intel has already started using hafnium based high-k/metal gate technology in there current generation of 45nm processor technology and they will start production of 32nm chips in 2009.